Costas J. Spanos

Professor

Department of Electrical Engineering and Computer Sciences

University of California, Berkeley CA 94720-1770

(510) 643 6776, fax (510) 642 2739, spanos@eecs.berkeley.edu

 

Professional History

•        Department of EECS, UC Berkeley CA.

Jul 95 – present      Professor of Electrical Engineering and Computer Sciences

Jul 91 - Jun 95        Associate Professor of Electrical Engineering and Computer Sciences

Jul 88 - Jun 91        Assistant Professor of Electrical Engineering and Computer Sciences    

 

Specializing in computer-aided manufacturing systems for Integrated Circuit (IC) production.

 

Present Appointments:

Associate Dean for Research in the College of Engineering since October 2004.

Chief Technology Advisor and Chairman of OnWafer Technologies, an independent vendor of Semiconductor Manufacturing metrology tools (www.onwafer.com).

 

Select Past Appointments:

Editor of the IEEE Journal “Transactions on Semiconductor Manufacturing” 1991-1994.

Director of the Berkeley Microfabrication Laboratory 1993-2000.

Principal Investigator, multi-campus “Small Feature Reproducibility” project 1998- 2003.

Intellectual Property expert for Texas Instruments  1998-2000.

Co-Founder and CEO, OnWafer Technologies, 2000-2002 (on leave from UCB).

Chief Technical Officer, OnWafer Technologies, 2003-2005 (on leave from UCB).

Director of the Electronics Research Laboratory since July 2004 - 2005.

 

•        Semiconductor Engineering Group, Advanced CAD, DEC, Hudson MA.

Oct  87 - Jul 88      Principal Software Engineer

Nov 85 - Oct 87    Senior Software Engineer

     

Developed procedures for the statistical characterization of IC fabrication lines. Supervised the statistical modeling of IC fabrication processes in the Hudson facility. Developed method­ologies for the diagnosis of IC fabrication line faults.

 

•        Carnegie Mellon University, Pittsburgh, PA

May 85 - Nov 85   Post Doctorate (on leave to DEC)

Sept 80 - May 85   Research Assistant

 

Completed an M.S. and a Ph.D. dissertation on the subject of statistical parameter extraction for IC process characterization. Participated in teaching technology transfer courses on statis­tical process & device simulation.

 

Education

 

•        May 85, Ph.D. in Electrical Engineering, specialized in Computer-Aided Fabrication of ICs. Carnegie Mellon University, Pittsburgh, PA.

Thesis subject: Statistical IC Process Characterization.

Thesis advisor: Professor S. W. Director.

 

•        July 81, M.S. in Electrical Engineering, specialized in Computer-Aided Design of ICs. Carnegie Mellon University, Pittsburgh, PA.

Thesis subject: Techniques for bi-Objective Decision Making.

Thesis advisor: Professor S. W. Director.

 

•        June 80, Diploma (5 years, honors) in Electrical Engineering, specialized in Electronics. National Technical University of Athens, Greece.

Thesis subject: Hybrid Computer Communication Protocols.

Thesis advisor: Professor E. N. Protonotarios

 

 

Honors, Awards and Personal Data

 

•        Born in 1957 in Athens, Greece. Married, two children. U.S. Citizen.

•        Fluent in English and Greek, proficient in German and French.

•        Graduated with honors from the National Technical University of Athens, Greece.

•        1977 Greek Institute of State Scholarships Award.

•        1979 Greek Institute of State Scholarships Award.

•        1992 International Semiconductor Manufacturing Science Sympo­sium Best Paper Award

•        1997 IEEE Transactions in Semiconductor Manufacturing Best Paper Award

•        2001 IEEE Transactions in Semiconductor Manufacturing Best Paper Award

•        2005 IEEE Transactions in Semiconductor Manufacturing Best Paper Award

•        Fellow of the IEEE, class of 2000

 

Refereed Journal Publications

 

1.      C. J. Spanos and S. W. Director, “Parameter Extraction for Statistical IC Process Characterization”, IEEE Trans. on CAD Vol. CAD-5 No 1, pp. 66-79, January 1986

2.      C. J. Spanos, “Statistical Significance of Error-Corrupted IC Measurements”, IEEE Trans. on Semiconductor Manufacturing Vol. 2 No 1, pp. 23-27, February 1989.

3.      K. K. Lin and C. J. Spanos, “Statistical Equipment Modeling for VLSI Manufacturing: An Application for LPCVD”, IEEE Trans. on Semiconductor Manufacturing Vol. 3, No 4, pp. 216-30, November 1990.

4.      N. H. Chang and C. J. Spanos, “Continuous Equipment Diagnosis Using Evidence Integration: An Application for LPCVD”, IEEE Trans. on Semiconductor Manufacturing Vol. 4 No 1, pp. 43-51, February 1991.

5.      G.S. May, C. J. Spanos and J. Huang, “Statistical Experimental Design in Plasma Etch Modeling”, IEEE Trans. on Semiconductor Manufacturing Vol-4 No 2, pp. 83-99, May 1991.

6.      C. J. Spanos, “Statistical Process Control in Semiconductor Manufacturing”, Proceedings of the IEEE, Vol. 80, No. 6, pp. 819-30, June 1992.

7.      C. J. Spanos, Haifang Guo, Alan Miller and Joanne Levine-Parrill, “Real-Time Statistical Process Control Using Tool Data”, IEEE Trans. on Semiconductor Manufacturing, Vol. 5, No 4, pp. 308-18, November 1992.

8.      G. S. May and C. J. Spanos, “Automated Malfunction Diagnosis of Semiconductor Fabrication Equipment: A Plasma Etch Application”, IEEE Trans. on Semiconductor Manufacturing, Vol. 6, No 1, pp. 28-40, February 1993.

9.      E. Boskin, C. J. Spanos, G. Korsh, “A Method for Modeling the Manufacturability of IC Designs”, IEEE Trans. on Semiconductor Manufacturing, Vol. 7, No 3, pp. 298-305, August 1994.

10.  S. Lee and C. Spanos, “RTSPC: A Software Utility for Real-Time SPC and Tool Data Analysis”, IEEE Trans. on Semiconductor Manufacturing, Vol. 8, No 1, pp. 17-25, February 1995.

11.  C. Yu, T. Maung, C. J. Spanos, D. Boning, J. Chung, H-Y Liu, K-J Chang and D. Bartelink, “Use of Short-Loop Electrical Measurements for Yield Improvement”, IEEE Trans. on Semiconductor Manufacturing, Vol. 8, No 2, pp. 150-159, May 1995.

12.  S. Cunningham, C. J. Spanos, K. Voros, “Semiconductor Yield Improvement: Results and Best Practices”, IEEE Trans. on Semiconductor Manufacturing, Vol. 8, No 2, pp. 103-109, May 1995.

13.  S. Lee and C. Spanos, “Prediction of Wafer State After Plasma Processing Using Real-Time Tool Data”, IEEE Trans. on Semiconductor Manufacturing, Vol 8, No 2, pp. 252-61, August 1995.

14.  S. Leang and C. Spanos, “A Novel In-line Automated Metrology for Photolithography”, IEEE Trans. on Semiconductor Manufacturing, Vol 9, No 1, pp. 101-7, February 1996.

15.  Crid Yu, C. Spanos, Hua Yu Liu and Dirk Bartelink, "Lithography Error Sources Quantified by Statistical Metrology", Solid State Technology, February 1996.

16.  S. Leang, S-Y Ma, J. Thomson, B. Bombay and C. Spanos, “A Control System for Photolithographic Sequences”, IEEE Trans. on Semiconductor Manufacturing, Vol 9, No 2, pp. 191-207, May 1996.

17.  E. Palmer, W. Ren, C. J. Spanos and K. Poolla, “Control of Photoresist Properties: A Kalman Filter Based Approach”, IEEE Trans. on Semiconductor Manufacturing, Vol 9, No 2, pp. 208-14, May 1996.

18.  Roawen Chen, Herb Huang, C. J. Spanos, Michael Gatto, "Plasma Etch Modeling Using Optical Emission Spectroscopy", Journal of Vacuum Science Technology, A 14(3), May/ June 1996.

19.  Antonio J. Miranda and Costas J. Spanos, "Impedance Modeling of a Cl2/He Plasma Discharge", Journal of Vacuum Science Technology, A 14(3), May/June 1996.

20.  Crid Yu, H.-Y. Liu and C. J. Spanos, "Patterning Tool Characterization by Causal Variability Decomposition", IEEE Trans. on Semiconductor Manufacturing, Vol 9, No 4, pp. 527-35, November 1996.

21.  C. J. Spanos and R. Chen, “Qualitative Modeling for Process Control in Semiconductor Manufacturing”, IEEE Trans. on Semiconductor Manufacturing, Vol 10, No 2, pp. 307-16, May 1997.

22.  S. Leang and C. Spanos, “A General Equipment Diagnosis System and its Application on  Photolithographic Sequences”,  IEEE Trans. on Semiconductor Manufacturing, Vol 10, No 3, pp. 329-43, August 1997

23.  Zhihao Lin, Member, IEEE, Costas J. Spanos, Senior Member, IEEE, Linda S. Milor, Member, IEEE, and Y. T. Lin, “Circuit Sensitivity to Interconnect Variation”, IEEE Trans. on Semiconductor Manufacturing, Vol. 11, No. 4, pp. 557-68, November 1998

24.  Xinhui Niu, Nickhil Jakatdar, Junwei Bao, Costas Spanos, “Specular Spectroscopic Scatterometry”, IEEE Trans. on Semiconductor Manufacturing, Vol. 14, No. 2, pp. 97-111, May, 2001.

25.  Mason Freed, Michiel Kruger, Costas Spanos and Kameshwar Poolla, “Autonomous on-wafer sensors for process modeling, diagnosis, and control”, IEEE Trans. on Semiconductor Manufacturing, Vol. 14, No. 3, pp. 255-264, Aug, 2001.

26.  Jiangxin Wang and Costas J. Spanos, “Real Time Furnace Modeling and Diagnostics”, IEEE Trans. on Semiconductor Manufacturing, Vol. 15, No. 4, pp. 393-403, November 2002.

27.  Payman Jula, Costas J. Spanos, Fellow, IEEE, and Robert C. Leachman, “Comparing the Economic Impact of Alternative Metrology Methods in Semiconductor Manufacturing”, IEEE Trans. on Semiconductor Manufacturing, Vol. 15, No. 4, pp. 454-63, November 2002.

28.  Runzi Chang, Member, IEEE, Yu Cao, Member, IEEE, and Costas J. Spanos, Fellow, IEEE, “Modeling the Electrical Effects of Metal Dishing Due to CMP for On-Chip Interconnect Optimization”, IEEE Transactions on electron devices, vol. 51, NO. 10, OCTOBER 2004

29.  Freed, M.; Kruger, M.V.P.; Poolla, K.; Spanos, C.J. “Wafer-grown heat flux sensor arrays for plasma etch processes” IEEE Transactions on Semiconductor Manufacturing, Volume 18,  Issue 1,  Feb 2005 Page(s):148 - 162 (Best Paper Award)

30.  Runzi Chang and Costas J. Spanos, “Dishing-radius model of copper CMP dishing effects”, IEEE Transactions on Semiconductor Manufacturing, Volume 18,  Issue 2,  May 2005 Page(s):297 - 303

31.  Jason P. Cain, Patrick P. Naulleau, Eric M. Gullikson, Costas J. Spanos, “Lithographic characterization of the flare in the Berkeley 0.3 numerical aperture extreme ultraviolet microfield optic”, Journal of Vacuum Science Technology B, Vol. 24, No. 3, pp 1234-7, May/June 2006

 

Refereed Conference Publications

 

32.  E. N. Protonotarios, C. Spanos, E. Sykas and G. Kamarinos, “Hybrid Protocols for Computer Communication Networks”, MELECON Proceedings, Israel, 1980.

33.  C. J. Spanos and S. W. Director, “Prometheus: a method for VLSI process characterization”, ICCAD proceedings, Santa Clara CA, November 1983.

34.  C. J. Spanos, “Hippocrates: a methodology for IC process diagnosis”, ICCAD proceedings, Santa Clara CA, November 1986.

35.  D. A. Hodges, L. A. Rowe and C. J. Spanos, “Computer Integrated Manufacturing”, International Electronics Manufacturing Technology Symposium, San Francisco CA, September 1989.

36.  K. K. Lin, J. Huang and C. J. Spanos, “Statistical Equipment Modeling for VLSI Manufacturing”, Meeting of the Electrochemical Society, Hollywood, Florida, October 1989.

37.  J. Huang, K. K. Lin, J. Lau, D. A. Hodges, C. J. Spanos, G. C. Johnson and R. T. Howe, “Texture of Undoped LPCVD Polycrystalline Silicon Films”, ASM Int. Symp. Textures in Non-Metallic Materials, Indianapolis, Indiana, October 1989.

38.  J. Huang, K. K. Lin, C. J. Spanos, D. A. Hodges, G. C. Johnson and R. T. Howe, “Polysilicon Process Characterization for Microstructural Applications”, ASM Int. Symp. Textures in Non- Metallic Materials, Indianapolis, Indiana, October 1989.

39.  N. H. Chang and C. J. Spanos, “Chronological Equipment Diagnosis Using Evidence Integration”, SPIE conference on Applications of Artificial Intelligence VIII, Orlando, Florida, April 1990.

40.  N. H. Chang and C. J. Spanos, “Continuous Diagnosis of Low-Pressure Chemical Vapor Deposition Reactors using Evidence Integration”, IEEE Symposium on VLSI Technology, Honolulu, Hawaii, June 1990.

41.  K. K. Lin and C. J. Spanos, “Computer-Aided Design of LPCVD Recipes”, IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, Danvers MA, September 1990.

42.  Z. M. Ling, S. Leang and C. J. Spanos, “A Lithography Workcell Monitoring and Modeling Scheme”, Microcircuit Engineering Conference, Leuven, Belgium, ME 13 (1991) pp. 537- 540, September 1990.

43.  G. S. May, J. Huang and C. J. Spanos, “Experimental Modeling of the Etch Characteristics of Polysilicon in CCl₄ / He / O₂ Plasmas”, 9th IEEE/CHMT International Electronics Manufacturing Technology Symposium, Washington DC, October 1990.

44.  Z. M. Ling, S. Leang and C. J. Spanos, “In-line Supervisory Control in a Photolithography Workcell”, SPIE Symposium on Microelectronics Processing Integration, Santa Clara, CA, October 5 1990.

45.  Z. M. Ling and C. J. Spanos, “A Novel Approach for Film Reflectance Measurement and its Application for the Control of a Photolithography Workcell”, 178th Meeting of the Electrochemical Society, Seattle, Washington, October 17 1990.

46.  E. D. Boskin and C. J. Spanos, “Worst Case Device Characterization for Statistical Circuit Design”, SRC Techcon, San Jose, CA, October 17 1990.

47.  T. Luan, G. S. May and C. J. Spanos, “Manufacturing-Based IC Process and Device Simulation”, SRC Techcon, San Jose, CA, October 17 1990.

48.  G. S. May and C. J. Spanos, “Automated Malfunction Diagnosis of a Plasma Etcher”,   International Semiconductor Manufacturing Sciences Symposium, San Mateo, CA, May 20- 22, 1991.

49.  H. F. Guo, C. J. Spanos and A. J. Miller, “Real-time Statistical Process Control in Plasma Etching”, International Semiconductor Manufacturing Sciences Symposium, San Mateo, CA, May 20-22, 1991.

50.  N. N. Tam, H. Y. Liu, C. J. Spanos and A. R. Neureuther, “A Statistically Based Model of Electron-Beam Exposed, Chemically Amplified Negative Resist”, 35th international Symposium on Electron, Ion & Photon Beams, Seattle WA May 28-31, 1991.

51.  B. Bombay and C. J. Spanos, “The Application of Adaptive Modeling to a Lithographic Process”, SPIE Symposium on Real time Monitoring and Control, September 1991. 

52.  S. Leang and C. J. Spanos, “Statistically Based Feedback Control of Photoresist Application”,   Advanced Semiconductor Manufacturing Symposium and Workshop, October 1991.

53.  E. Boskin, C. J. Spanos and G. Korsh, “IC Performance Prediction from Electrical Test Measurements”, International Semiconductor Manufacturing Sciences Symposium, San Francisco, CA, June 1992.

54.  S. Leang and C. J. Spanos, “Application of Feed-Forward Control to a Photolithography Stepper”, International Semiconductor Manufacturing Sciences Symposium, San Francisco, CA, June 1992.

55.  S. Leang and C. J. Spanos, “Applying Feed-Forward and Feedback control to a Photolithography Sequence”, Advanced Semiconductor Manufacturing Conference, Boston, MA, October 1992.

56.  R. Chen and C. J. Spanos, “Fuzzy Modeling of Semiconductor Processing Equipment”, Advanced Semiconductor Manufacturing Conference, Boston, MA, October 1992.

57.  E. Boskin, C. J. Spanos and G. Korsh, “A Method for Modeling the Manufacturability of IC Designs”, 1993 IC Modeling and Testing Symposium, Mandrid, Spain, March 1993.

58.  S. Cunningham, C. J. Spanos and J. Shantikumar, “Methods for Yield Improvement in the Semiconductor Industry”, The Institute of Management Sciences and Operations Research Society of America Joint Meeting, Chicago, May 1993.

59.  S. Lee and C. J. Spanos, “Real Time Diagnosis for Plasma Etch Equipment”, 1993 SRC Techcon, September 1993.

60.  C. Yu and C. J. Spanos, “A Manufacturable IC Fabrication Process”, 1993 SRC Techcon, September 1993.

61.  R. Chen and C. J. Spanos, “Statistical Data Pre-processing for Fuzzy Modeling of Semiconductor Manufacturing Process”, 3rd International Conference on Industrial; Fuzzy Control & Intelligent Systems, December 1993.

62.  S. Lee and C. J. Spanos, “Experimental Analysis and Wafer Parameter Prediction Using Real-Time Tool Data”, presented at the International Symposium on Semiconductor Manufacturing, June 1994.

63.  Z. Daoud and C. J. Spanos, “DORIC: Design of Optimal & Robust Integrated Circuits, Custom Integrated Circuit Conference, May 1994.

64.  P. M. Tsai, F. Nadi and C. J. Spanos, “A Neural Net based, in-line Focus/Exposure Monitor”, 1994 Advanced Semiconductor Manufacturing Conference and Workshop, November 1994.

65.  Hua-Yu Liu, Crid Yu, Bob Gleason and C. Spanos, "Contributions of Stepper Lenses to Systematic CD Errors Within Exposure Fields", SPIE, Santa Clara, CA, March 1995.

66.  Crid Yu and C. Spanos, "Manufacturability Evaluation of Exposure Tools using Statistical Metrology", Stat. Metrology Workshop, Austin, TX, August 1995

67.  M. Terrovitis and C. Spanos, "Device Mismatch and its Effect on Common Analog Subcircuits", Stat. Metrology Workshop, Austin, TX, August 1995

68.  Crid Yu, Hua-Yu Liu and C. Spanos, "Manufacturability Evaluation of Deep Submicron Exposure Tools Using Statistical Metrology", ISSM, September 1995

69.  Roawen Chen, Herb Huang, C. J. Spanos, Michael Gatto, "Plasma Etch Modeling Using Optical Emission Spectroscopy", 42nd National Symposium of the American Vacuum Society, Minneapolis, MN, October 1995

70.  Antonio J. Miranda and Costas J. Spanos, "Impedance Modeling of a Cl₂/He Plasma Discharge", 42nd National Symposium of the American Vacuum Society, Minneapolis, MN, October 1995

71.  Crid Yu, Anna Minvielle and C. Spanos, "SEM Characerization of Etch and Develop Contributions to Poly CD Error", SPIE, Santa Clara, CA, March 1996.

72.  Sean Cunningham and C. Spanos, "Applications of Spatial Statistics to Semiconductor Wafer Defects", First International Statistical Metrology Workshop, Honolulu, Hawaii, June 1996

73.  Mark Hatzilambrou, A. Neureuther and C. Spanos, "Ring Oscillator Sensitivity to Spatial Process Variation", First International Statistical Metrology Workshop, Honolulu, Hawaii, June 1996

74.  Manolis Terrovitis and C. Spanos, "Process Variability and Device Mismatch", First International Statistical Metrology Workshop, Honolulu, Hawaii, June 1996

75.  Crid Yu and C. Spanos, "Contribution of Etch to Metal CD Variability", First International Statistical Metrology Workshop, Honolulu, Hawaii, June 1996

76.  X. Niu and C. Spanos, "In-Situ Optical Metrology of Polycrystalline Silicon", Techcon '96, September 1996.

77.  R. Chen and C. Spanos, "The Application of In-line Sensors for Plasma Etch in Semiconductor  Manufacturing", Techcon '96, September 1996.

78.  Anna Ison and C. Spanos, "Accounting for Long Term Trends for Robust Fault Detection of Semiconductor Manufacturing Equipment", Techcon '96, September 1996.

79.  Anna Ison and C. Spanos, "Robust Fault Detection and Fault Classification of Semiconductor Manufacturing Equipment",  ISSM, Tokyo, October 1996.

80.  Roawen Chen and C. Spanos, "CD Monitoring using In-line Sensors",  ISSM, Tokyo, October 1996.

81.  Z. Lin, C. Spanos, L. Milor and Y. Lin, "Study of Circuit Sensitivity to Interconnect Variation", Second International Statistical Metrology Workshop, Kyoto, Japan, June 1997.

82.  X. Niu and C. Spanos, "Statistical Enhancement of a Reflectometry Metrology System", Second International Statistical Metrology Workshop, Kyoto, Japan, June 1997.

83.  Roawen Chen and Costas J. Spanos, “Plasma Etch Monitoring with In-Situ Optical Emission Spectroscopy”, AEC/APC Symposium IX, Lake Tahoe, September, 1997.

84.  Nickhil Jakatdar and Costas J. Spanos, “Novel METROLOGY FOR THE Photolithography Sequence”, AEC/APC Symposium IX, Lake Tahoe, September, 1997.

85.  Anna Ison and Costas J. Spanos, “Fault Detection of Plasma Etch Equipment”, AEC/APC Symposium IX, Lake Tahoe, September, 1997.

86.  John Musacchio, C. Spanos and K. Poolla, "On the Utility of Run-to-Run Control in Semiconductor Manufacturing", Sixth International Symposium on Semiconductor Manufacturing, San Francisco, CA, October, 1997.

87.  Anna Ison and C. Spanos, "Fault Diagnosis for Plasma Etch Equipment", Sixth International Symposium on Semiconductor Manufacturing, San Francisco, CA, October, 1997

88.  Sundeep Rangan, C. Spanos and K. Poolla, "Modeling and Filtering Optical Emission Spectroscopy for Plasma Etching Systems", Sixth International Symposium on Semiconductor Manufacturing, San Francisco, CA, October, 1997

89.  Roawen Chen and C. Spanos, "Monitoring Etch Uniformity by Scanning Spatially-Resolved Optical Emission Spectroscopy", Sixth International Symposium on Semiconductor Manufacturing, San Francisco, CA, October, 1997

90.  Nickhil Jakatdar, Xinhui Niu, Costas Spanos, "A Neural Network Approach to Rapid Thin Film Characterization", Flatness, Roughness and Discrete Defects Characterization for Computer Disks, Wafers and Flat Panel Displays II LASE-98 Precision Manufacturing Technologies Photonics West, SPIE, January 1998

91.  Xinhui Niu, Nickhil Jakatdar, Costas Spanos, Novel DUV Photoresist Modeling by optical thin film decomposition from ellipsometry/reflectometry data", Flatness, Roughness and Discrete Defects Characterization for Computer Disks, Wafers and Flat Panel Displays II LASE-98 Precision Manufacturing Technologies Photonics West, SPIE, January 1998

92.  Nickhil  Jakatdar, Xinhui Niu, Costas Spanos, Andy Romano, Joe Bendik, John Plummer, Ronald Kovacs, Stephen Hill, "Characterization of a Positive Chemically Amplified Photoresist from the Viewpoint of Process Control for the Photolithography Sequence", Metrology, Inspection and Process Control for Microlithography XII SPIE's 23rd Annual International Symposium on Microlithography, February 1998

93.  Nickhil  Jakatdar, Xinhui Niu, Costas Spanos, Matt Hankinson, Andy Romano, Joe Bendik, John Plummer, Ronald Kovacs, "In-situ Metrology for Deep Ultraviolet Lithography Process Control", Metrology, Inspection and Process Control for Microlithography XII SPIE's 23rd Annual International Symposium on Microlithography, February 1998.

94.  Nickhil H. Jakatdar, Xinhui Niu, Costas J. Spanos, Andrew R. Romano, Joseph J. Bendik, Ronald P. Kovacs, and Stephen L. Hill, “Characterization of a positive chemically amplified photoresist for process control”,  Proc. SPIE Int. Soc. Opt. Eng. 3332, 586 (1998)

95.  Nickhil H. Jakatdar, Xinhui Niu, and Costas J. Spanos, “Characterization of a chemically amplified photoresist for simulation using a modified "poor man's DRM" methodology”, Proc. SPIE Int. Soc. Opt. Eng. 3332, 578 (1998)

96.  Xinhui Niu, Nickhil Jakatdar, Costas Spanos, Joe Bendik, John Plummer, Ronald Kovacs, "Optical thin film decomposition for DUV positive tone resist process monitoring", Metrology, Inspection and Process Control for Microlithography XII SPIE's 23rd Annual International Symposium on Microlithography, February 1998.

97.  Nickhil Jakatdar, Xinhui Niu, Haolin Zhang, Junwei Bao, Costas Spanos, "Novel Metrology for the DUV Photolithography Sequence", International Conference on Characterization and Metrology for ULSI Technology, Washington DC, March 1998 .

98.  Haolin Zhang , C. J. Spanos, “CD-SEM Based Pattern Recognition for Focus/Exposure Control”, AEC/APC Symposium X, Vail, Colorado, October, 1998.

99.  N. Jakatdar, X. Niu, J. Musacchio, J. Bao, and C. Spanos, “DUV Lithography Control”, AEC/APC Symposium X, Vail, Colorado, October, 1998.

100.         Anna Ison, DongWu Zhao and Costas Spanos, “In-sity plasma etch fault Diagnosis using Real-Time and High resolution Sensor Signals”, AEC/APC Symposium X, Vail, Colorado, October, 1998.

101.         Nickhil Jakatdar , Junwei Bao, C. J. Spanos - U.C. Berkeley, Ramkumar Subramanian, Bharath Rangarajan - Advanced Micro Devices, “Physical modeling of deprotection-induced thickness loss”, Metrology, Inspection and Process Control for Microlithography XII SPIE's 24th Annual International Symposium on Microlithography, SPIE February 1999. Proc. SPIE Int. Soc. Opt. Eng. 3678, 275 (1999)

102.         Xinhui Niu - Timbre Technology Inc. Nickhil Jakatdar , Junwei Bao, C. J. Spanos - U.C. Berkeley, Sanjey Yadur - Advanced Micro Devices and SEMATECH, “Specular spectroscopic scatterometry in DUV lithography”, Metrology, Inspection and Process Control for Microlithography XII SPIE's 24th Annual International Symposium on Microlithography, SPIE February 1999. Proc. SPIE Int. Soc. Opt. Eng. 3677, 159 (1999)  

103.         Nickhil Jakatdar , Junwei Bao, C. J. Spanos - U.C. Berkeley, Xinhui Niu - Timbre Technology Inc. Joe Bendik - National Semiconductor Corporation, Stephen Hill - Bio-Rad, “Parameter extraction framework for DUV lithography simulation”, Metrology, Inspection and Process Control for Microlithography XII SPIE's 24th Annual International Symposium on Microlithography, SPIE February 1999.  Proc. SPIE Int. Soc. Opt. Eng. 3677, 447 (1999)

104.         Xinhui Niu - Timbre Technology Inc., Nickhil Jakatdar , C. J. Spanos - U.C. Berkeley, Bob Socha, Joe Bendik - National Semiconductor Corporation, “Deep-ultraviolet lithography simulator tuning by resist profile matching”, International Symposium on Microelectronic Manufacturing Technologies, 1999. Proc. SPIE Int. Soc. Opt. Eng. 3741, 245 (1999)

105.         Nickhil Jakatdar , Junwei Bao, C. J. Spanos - U.C. Berkeley, Ramkumar Subramanian, Bharath Rangarajan - Advanced Micro Devices, Andy Romano - AZ Division, Clariant Corporation, “Physically based model for predicting volume shrinkage in chemically amplified resists”, International Symposium on Microelectronic Manufacturing Technologies, 1999. Proc. SPIE Int. Soc. Opt. Eng. 3743, 16 (1999)

106.         Mike Ostarnski, Costas Spanos and Chenming Hu, "Circuit Performance Variability Decomposition", Fourth International Statistical Metrology Workshop, Kyoto, Japan, June 1999.

107.         Darin Fisher, Mason Freed, Costas Spanos and Kameshwar Poolla, “Microsensor Arrays for Calibration, Control and Monitoring of Semiconductor Manufacturing Processes”, IEEE International Conference on Control Applications and Symposium on Computer-Aided Control System Design, Hawaii, August, 1999.

108.         J. Bokor, N. Cheung, D. Dornfeld, D. Graves, E. Haller, M. Lieberman, A. Neureuther, K. Poolla, C. Spanos, R. Smith, O. Solgaard, B. Dunn, E. Aydil, “The Small Feature Reproducibility Project”,  AEC/APC Symposium XI, Vail, Colorado, September, 1999.

109.         Junwei Bao, Nickhil Jakatdar ,C. J. Spanos,  Joseph J. Bendik, Xinhui Niu, “Specular spectral profilometry on metal layers”, Microlithography, SPIE, February, 2000 . Proc. SPIE Int. Soc. Opt. Eng. 3998, 882 (2000)

110.         Nickhil H. Jakatdar, Xinhui Niu, Junwei Bao, Costas J. Spanos, Sanjay K. Yedur, and Alain G. Deleporte, “Phase profilometry for the 193-nm lithography gate stack”, Proc. SPIE Int. Soc. Opt. Eng. 3998, 116 (2000)

111.         Michiel V.P. Krüger, Michael H. Guddal, Ruslan Belikov, Aparna Bhatnagar, Olav Solgaard, Costas Spanos, and Kameshwar Poolla “Low Power Wireless Readout of Autonomous Sensor Wafer using MEMS Grating Light Modulator”, Optical MEMs 2K,  Hawaii, August 2000.

112.         Jiangxin Wang and C. J. Spanos, “A Sensor Fusion Based Methodology for Real Time Furnace Diagnostics”, ASMC, September, 2000.

113.         Mason Freed, Michiel Krüger, Kameshwar Poolla, and Costas Spanos, “Real Time In-Situ Data Acquisition Using Autonomous On-Wafer Sensor Arrays”, ISSM, September, 2000.

114.         N. Chong, J. Lim, J. Sakamoto, B. Dunn, M. Kruger, M. Freed, S. Eitapence, K. Poolla, and C. Spanos,"Lithium Batteries For Powering Sensor Arrays", 198th meeting of the Electrochemical Society, Phoenix, Az, October, 2000

115.         Jiangxin Wang and Costas J. Spanos, “A Novel approach for modeling and diagnostics”, AEC/APC Symposium XII, Banf, Canada, October 2001.

116.         Junwei Bao and Costas J. Spanos, “A Simulation framework for lithography process monitoring and control using scatterometry”, AEC/APC Symposium XII, Banf, Canada, October 2001

117.         Dong Wu Zhao and Costas J. Spanos, “Towards a Complete Plasma Diagnostic System”, ICCM, Santa Clara, CA, October 2001.

118.         Runzi Chang and Costas J. Spanos, “Full Profile Inter-Layer Dielectric (ILD) CMP Metrology”, ICCM, Santa Clara, CA, October 2001.

119.         Payman Jula, Costas J. Spanos, Robert C. Lieberman, “The Economic Impact of Choosing off-line, inline or insitu Metrology Deployment in Semiconductor Manufacturing”, ICCM, Santa Clara, CA, October 2001.

120.         Haolin Zhang, Jason Cain and Costas J. Spanos, “Compact formulation of mask error factor for critical dimension control in optical lithography”,”,  SPIE February 2002. Proc. SPIE Int. Soc. Opt. Eng. 4689, 462 (2002) .

121.         Jason P. Cain, Haolin Zhang, and Costas J. Spanos, "Optimum sampling for characterization of systematic variation in photolithography",  SPIE February 2002. Proc. SPIE Int. Soc. Opt. Eng. 4689, 430 (2002)

122.         David Steele, Anthony Coniglio, Cherry Tang, Bhanwar Singh, Costas Spanos, Steve Nip, “Characterizing post-exposure bake processing for transient- and steady-state conditions in the context of critical dimension control”, SPIE Feb